High-sensitivity inspection of the ultra-low-density defects in thin films using dark-field spatial correlation spectrum
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作者
Li, Xinlong; Meng, Xiangyu; Wang, Yong; Liu, Haigang; Zhang, Yufei; Zhang, Xiangzhi; Zhao, Bo; Zhao, Jun; Tai, Renzhong
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刊物名称
PHYSICA SCRIPTA
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年、卷、文献号
2025, 4,
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关键词
Li, Xinlong; Meng, Xiangyu; Wang, Yong; Liu, Haigang; Zhang, Yufei; Zhang, Xiangzhi; Zhao, Bo; Zhao, Jun; Tai, Renzhong
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摘要
A high-sensitivity inspection method for ultra-low-density defects in the thin films is presented by performing spatial correlation calculations on the x-ray dark-field scattering. The sensitivity of defect inspection is theoretically analyzed under varying exposure times and defect thicknesses. The simulation results demonstrate a 25 times increase in inspection sensitivity compared to scanning scattering contrast microscopy (SSCM). An experiment was performed at the Shanghai Synchrotron Radiation Facility and a 56 nm particle defect was successfully inspected with the sensitivity of 8.3. Both theoretical and experimental results indicate that the dark-field spatial correlation spectrum method holds significant potential for advanced defect inspection.
